An Information-Theoretic Measure for Pattern Similarity in Analog Wafermaps

~ 1 ~ An Information-Theoretic Measure for Pattern Similarity in Analog Wafermaps Bernhard C. Geiger , Stefan Schrunner , Roman Kern 1 Know-Center GmbH, Graz, AT 2 KAI Kompetenzzentrum Automobilund Industrieelektronik GmbH, Villach, AT * equal contribution Presenter: Bernhard C. Geiger E-mail: bgeiger@know-center.at Presentation (oral and/or poster): oral TOPIC: Please select one or more fitting topic(s) for your contribution from the list. (1=first, 2=second etc. choice) Process Level APC  Plasma etch, CVD and ALD  Sputtering, P3I, and e--beam  Lithography  Thermal, wet processing & CMP  Backend  Metrology and R2R  APC for legacy tools Fab Level APC  Fab level process control methods  Virtual metrology  Yield management 2 Factory data analysis  IT infrastructure Manufacturing Effectiveness and Productivity  Unit process & equipment productivity 1 Factory productivity and automation  Factory modeling, simulation and optimization  Cost optimization and end-of-life equipment issues  Environment and Green Manufacturing 19 European Advanced Process Control and Manufacturing Conference (apc|m) Villach, AUSTRIA April 08-10, 2019

[1]  Jianhua Lin,et al.  Divergence measures based on the Shannon entropy , 1991, IEEE Trans. Inf. Theory.