An Information-Theoretic Measure for Pattern Similarity in Analog Wafermaps
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~ 1 ~ An Information-Theoretic Measure for Pattern Similarity in Analog Wafermaps Bernhard C. Geiger , Stefan Schrunner , Roman Kern 1 Know-Center GmbH, Graz, AT 2 KAI Kompetenzzentrum Automobilund Industrieelektronik GmbH, Villach, AT * equal contribution Presenter: Bernhard C. Geiger E-mail: bgeiger@know-center.at Presentation (oral and/or poster): oral TOPIC: Please select one or more fitting topic(s) for your contribution from the list. (1=first, 2=second etc. choice) Process Level APC Plasma etch, CVD and ALD Sputtering, P3I, and e--beam Lithography Thermal, wet processing & CMP Backend Metrology and R2R APC for legacy tools Fab Level APC Fab level process control methods Virtual metrology Yield management 2 Factory data analysis IT infrastructure Manufacturing Effectiveness and Productivity Unit process & equipment productivity 1 Factory productivity and automation Factory modeling, simulation and optimization Cost optimization and end-of-life equipment issues Environment and Green Manufacturing 19 European Advanced Process Control and Manufacturing Conference (apc|m) Villach, AUSTRIA April 08-10, 2019
[1] Jianhua Lin,et al. Divergence measures based on the Shannon entropy , 1991, IEEE Trans. Inf. Theory.