An alternative interpretation of hot electron interface degradation in NMOSFETs: isotope results irreconcilable with major defect generation by holes?
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K. Hess | J. Lyding | Young-Wug Kim | K. Suh | Jinju Lee | Zhi Chen | Young-Kwang Kim | Bong-Seok Kim | Yong-hee Lee | Yong-Hee Lee
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