The effects of ionizing radiation on commercial power MOSFETs operated at cryogenic temperatures
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[1] Bruce E. Deal,et al. Interface states and electron spin resonance centers in thermally oxidized (111) and (100) silicon wafers , 1981 .
[2] D. Fleetwood,et al. Effects of oxide traps, interface traps, and ‘‘border traps’’ on metal‐oxide‐semiconductor devices , 1993 .
[3] David L. Griscom,et al. Formation of interface traps in MOSFETs during annealing following low temperature irradiation , 1988 .
[4] H. E. Boesch,et al. An Electrical Technique to Measure the Radiation Susceptibility of MOS Gate Insulators , 1979, IEEE Transactions on Nuclear Science.
[5] Kenneth F. Galloway,et al. Separation of effects of oxide-trapped charge and interface-trapped charge on mobility in irradiated power MOSFETs , 1993 .
[6] Krishna Shenai,et al. Performance potential of low-voltage power MOSFETs in liquid-nitrogen-cooled power systems , 1991 .
[7] O. Mueller,et al. On-resistance, thermal resistance and reverse recovery time of power MOSFETs at 77 K , 1989 .
[8] P. Winokur,et al. Simple technique for separating the effects of interface traps and trapped‐oxide charge in metal‐oxide‐semiconductor transistors , 1986 .
[9] Kenneth F. Galloway,et al. Dose-rate effects on the total-dose threshold-voltage shift of power MOSFETs , 1988 .
[10] J Gowar,et al. Power MOSFETs: Theory and Applications , 1989 .
[11] Patrick M. Lenahan,et al. Hole traps and trivalent silicon centers in metal/oxide/silicon devices , 1984 .
[12] Daniel M. Fleetwood,et al. Estimating oxide‐trap, interface‐trap, and border‐trap charge densities in metal‐oxide‐semiconductor transistors , 1994 .
[13] D. Fleetwood. 'Border traps' in MOS devices , 1992 .
[14] Bantval J. Baliga,et al. Analysis and optimization of power MOSFETs for cryogenic operation , 1993 .
[15] N. S. Saks,et al. Generation of Interface States by Ionizing Radiation at 80K Measured by Charge Pumping and Subthreshold Slope Techniques , 1987, IEEE Transactions on Nuclear Science.