High-speed resonant cavity enhanced Ge photodetectors on reflecting Si substrates for 1550-nm operation
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D. D. Cannon | M.K. Emsley | O. Dosunmu | M. Unlu | L. Kimerling | O.I. Dosunmu | D.D. Cannon | L.C. Kimerling | M.S. Unlu | M. Emsley
[1] B. Ghyselen,et al. Resonant cavity enhanced Ge photodetectors for 1550 nm operation on reflecting Si substrates , 2004, IEEE Journal of Selected Topics in Quantum Electronics.
[2] Yasuhiko Ishikawa,et al. Tensile strained epitaxial Ge films on Si(100) substrates with potential application in L-band telecommunications , 2004 .
[3] Gianlorenzo Masini,et al. 2.5 Gbit/s polycrystalline germanium-on-silicon photodetector operating from 1.3 to 1.55 μm , 2003 .
[4] Yasuhiko Ishikawa,et al. Strain-induced band gap shrinkage in Ge grown on Si substrate , 2003 .
[5] D. D. Cannon,et al. Near-infrared Ge Photodetectors Fabricated on Si Substrates with CMOS Technology , 2003 .
[6] M.K. Emsley,et al. High-speed resonant-cavity-enhanced silicon photodetectors on reflecting silicon-on-insulator substrates , 2002, IEEE Photonics Technology Letters.
[7] E. Ozbay,et al. InGaAs-based high-performance p-i-n photodiodes , 2002, IEEE Photonics Technology Letters.
[8] Gianlorenzo Masini,et al. High performance germanium-on-silicon detectors for optical communications , 2002 .
[9] Lionel C. Kimerling,et al. Silicon Microphotonics , 2002 .
[10] C. Schow,et al. Resonant-cavity-enhanced high-speed Si photodiode grown by epitaxial lateral overgrowth , 1999, IEEE Photonics Technology Letters.
[11] Kazumi Wada,et al. High-quality Ge epilayers on Si with low threading-dislocation densities , 1999 .
[12] L. Kimerling,et al. A New Approach of Photonic Bandgap Formation -Wafer Bonding and Delamination Technique- , 1998 .
[13] Leigh T. Canham,et al. Progress towards silicon optoelectronics using porous silicon technology , 1996 .
[14] J. Muszalski,et al. Resonant cavity enhanced photonic devices , 1995 .
[15] M. Bruel. Silicon on insulator material technology , 1995 .