论文信息 - Plasma-Enhanced Chemical Vapor Deposition of ZrF 4 -Based Fluoride Glass Film and Oxygen Doping Effects on Glass Forming Ability - 字舞流文

Plasma-Enhanced Chemical Vapor Deposition of ZrF 4 -Based Fluoride Glass Film and Oxygen Doping Effects on Glass Forming Ability

Y. Nishida | K. Fujiura | Shirō Takahashi | K. Kobayashi

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