Statistical modeling and circuit simulation for design for manufacturing

A method to include effects of statistical fluctuations, inherent to the semiconductor manufacturing process, in circuit simulation models is presented. It appears that several contributions must be distinguished for a correct statistical model. The benefit over traditional best/worst case modeling is shown. The relation between statistical modeling and process control is discussed.

[1]  Wojciech Maly,et al.  Computer-aided design for VLSI circuit manufacturability , 1990, Proc. IEEE.

[2]  T. Smedes,et al.  Practical modeling of the effects of processing fluctuations on circuit behaviour , 1997, 1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat. No.97CH36023).

[3]  P. Stolk,et al.  The effect of statistical dopant fluctuations on MOS device performance , 1996, International Electron Devices Meeting. Technical Digest.

[4]  M.J.M. Pelgrom,et al.  Matching properties of MOS transistors , 1989 .

[5]  M.J. van Dort,et al.  Circuit sensitivity analysis in terms of process parameters , 1995, Proceedings of International Electron Devices Meeting.