Degradation of GaAs0.9P0.1 light‐emitting diodes for optical fiber communication with internal stress

Degradation mechanisms of GaAs0.9P0.1 light‐emitting diodes for optical fiber communication systems were studied to elucidate the effects of internal compressive stress (on the order of 107–108 dyn/cm2) on initial rapid degradation. The diodes were fabricated from wafers with various phosphorus composition gradients (?0.7%/μm) in the tapered layer.Experimental results from the degradation of the diodes operating at 660 A/cm2 showed that the lifetimes of the diodes increased with decreasing the compositional grading in the crystals. The improved lifetime is due not only to the suppression of 〈110〉 dark‐line defects but also to the slow growth velocities of 〈100〉 dark‐line defects and due to slow accumulation rates of nonradiative recombination centers near the PN junctions at low internal stress. For the first time, the growth velocities of 〈100〉 dark‐line defects during initial rapid degradation were observed to depend on the internal compressive stress.

[1]  J. Gannon,et al.  Optimization of Electroluminescent Efficiencies for Vapor‐Grown GaAs1 − x P x Diodes , 1969 .

[2]  M. Iwamoto,et al.  Observation of dark line defects in GaP green LED’s under an external uniaxial stress , 1976 .

[3]  A. A. Bergh,et al.  Bulk degradation of GaP red LEDs , 1971 .

[4]  Koichi Ishida,et al.  Rapid Degradation in Double-Heterostructure Lasers. I. Proposal of a New Model for the Directional Growth of Dislocation Networks , 1975 .

[5]  L. R. Weisberg,et al.  Dislocation morphology in graded heterojunctions: GaAs1−xPx , 1969 .

[6]  A. Herzog,et al.  Dislocations and their Relation to Irregularities in Zinc‐Diffused GaAsP p‐n Junctions , 1968 .

[7]  J. Matsui,et al.  Nature of 〈110〉 dark‐line defects in degraded (GaAl)As‐GaAs double‐heterostructure lasers , 1977 .

[8]  N. Chinone,et al.  Growth and propagation mechanism of 〈110〉‐oriented dark‐line defects in GaAs‐Ga1−xAlxAs double heterostructure crystals , 1977 .

[9]  P. Petroff,et al.  Rapid degradation phenomenon in heterojunction GaAlAs-GaAs lasers , 1974 .

[10]  D. Parker,et al.  Coefficient of Expansion of GaAs, GaP, and Ga(As, P) Compounds from −62° to 200°C , 1967 .

[11]  M. Straumanis,et al.  Thermal Expansion Coefficients and Lattice Parameters between 10° and 65°C in the System GaP ‐ GaAs , 1967 .

[12]  K. Kurata,et al.  A Cross‐Hatch Pattern in GaAs1 − x P x Epitaxially Grown on GaAs Substrate , 1972 .

[13]  R. H. Saul Effect of a GaAsxP1−x Transition Zone on the Perfection of GaP Crystals Grown by Deposition onto GaAs Substrates , 1969 .

[14]  R. Clough,et al.  The preparation and properties of vapor- deposited epitaxial InAs sub 1-x P sub x using arsine and phosphine. , 1966 .

[15]  H. Kan,et al.  Etch Pit Observation of Very Thin {001}-GaAs Layer by Molten KOH , 1976 .

[16]  P. Hutchinson,et al.  Defect structure of degraded heterojunction GaAlAs−GaAs lasers , 1975 .

[17]  J. Matsui,et al.  Injection-Enhanced Dislocation Glide under Uniaxial Stress in GaAs–(GaAl)As Double Heterostructure Laser , 1977 .

[18]  B. Monemar,et al.  Secondary dislocation climb during optical excitation of GaAs laser material , 1978 .

[19]  The stress‐enhanced diffusion of boron in silicon , 1978 .

[20]  J. Angilello,et al.  The interpretation of dislocation contrast in x‐ray topographs of GaAs1−x Px , 1974 .

[21]  L. R. Weisberg,et al.  Stresses in Heteroepitaxial Layers: GaAs1−xPx on GaAs , 1969 .