ULVAC research and development of Cat-CVD applications
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Kazuya Saito | M. Hashimoto | M. Takagi | Masamichi Harada | S. Asari | Tetsushi Fujinaga | Michio Ishikawa
[1] Kazuya Saito,et al. A layer-by-layer Cat-CVD of conformal and stoichiometric silicon nitride with in-situ H2 post-treatment , 2006 .
[2] Kazuya Saito,et al. Development of catalytic chemical vapor deposition apparatus for large size substrates , 2004 .
[3] Kazuya Saito,et al. Coverage properties of silicon nitride film prepared by the Cat-CVD method , 2003 .
[4] K. Ishibashi. Development of the Cat-CVD apparatus and its feasibility for mass production , 2001 .
[5] A. Izumi,et al. Novel chamber cleaning method using atomic hydrogen generated by hot catalyzer , 2001 .