Post-Annealing Effects on Fixed Charge and Slow/Fast Interface States of TiN/Al2O3/p-Si Metal–Oxide–Semiconductor Capacitor
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Ho-Kyu Kang | C. Hwang | Jong-Ho Lee | N. Lee | Jaehoon Park | H. Cho | H. Kim | I. Jeon | Dail Eom | C. J. Park
暂无分享,去创建一个
Ho-Kyu Kang | C. Hwang | Jong-Ho Lee | N. Lee | Jaehoon Park | H. Cho | H. Kim | I. Jeon | Dail Eom | C. J. Park