Applications of Nanofabrication Technologies

In previous chapters, various nanofabrication technologies have been introduced. In practical applications, any fabrication technology will not be used alone. A structure or a device is not made by one fabrication technology but a combination of several technologies. The same goal can be reached by different ways. There are many factors which determine which specific technology to be used to achieve the final goal. For example, one particular technology may be superior to others in improving or advancing a specific aspect of performance in a device, or the technology is simpler than others and can lower the fabrication cost. There are also situations when fabrications have to be done using existing equipment when no other options are available. Any new application of a nanoscale structure or device is likely to be the result of not only a novel design but also an adoption of new fabrication technology, or a clever combination of different fabrication technologies. The developments of application and fabrication have always been interdependent on each other and advancing each other. The constant demand of new applications is the market pull to advance fabrication technologies to make something better and cheaper. The continuous progress in research of new ways of making structures or devices is the technology push to inspire designers to come up with new applications. For example, semiconductor quantum devices were the direct result of high-resolution electron beam lithography which could make electrodes less than 100 nm. The demand for larger and larger scale of integrated circuits at low cost promoted the continuous advances in optical lithography and other lithographic techniques. This chapter intends to introduce some of the important applications of nanofabrication technologies, including the latest developments in these application areas. These applications have best manifested how modern nanofabrication technologies play an important role in these areas, and how fabrication and application rely on each other as well as advancing each other. It should be noted that nanofabrication cannot stand alone. It evolves from microfabrication and is often being used in combination with microfabrication. The boundary between microfabrication and nanofabrication is blurry and this chapter focuses on those applications which require mostly the fabrication of sub-100 nm features or structures.

[1]  Jon Orloff,et al.  High‐resolution focused ion beams , 1993 .

[2]  E. Suh,et al.  GaN-Based Light-Emitting Diodes on Micro-Lens Patterned Sapphire Substrate , 2008 .

[3]  Heon Lee,et al.  Fabrication of SiNx-based photonic crystals on GaN-based LED devices with patterned sapphire substrate by nanoimprint lithography. , 2012, Optics express.

[4]  E. Yablonovitch,et al.  Inhibited spontaneous emission in solid-state physics and electronics. , 1987, Physical review letters.

[5]  H. Craighead,et al.  Enumeration of DNA molecules bound to a nanomechanical oscillator. , 2005, Nano letters.

[6]  Toshihiko Kanayama,et al.  Channel waveguides fabricated in 2D photonic crystals of Si nanopillars , 2002 .

[7]  Kenneth A. Smith,et al.  Controlled deposition of individual single-walled carbon nanotubes on chemically functionalized templates , 1999 .

[8]  D. Larkman,et al.  Photonic crystals , 1999, International Conference on Transparent Optical Networks (Cat. No. 99EX350).

[9]  Z. Cui,et al.  Microfabrication and properties of the meta-materials , 2006 .

[10]  E. Wassermann,et al.  Fabrication of large scale periodic magnetic nanostructures , 1998 .

[11]  Martin Hegner,et al.  Cantilever array sensors , 2005 .

[12]  P. Chu,et al.  Hafnium-based High-k Gate Dielectrics , 2010 .

[13]  Bo-Wen Lin,et al.  The Formation and the Plane Indices of Etched Facets of Wet Etching Patterned Sapphire Substrate , 2012 .

[14]  R. Hsiao,et al.  Fabrication of magnetic recording heads and dry etching of head materials , 1999, IBM J. Res. Dev..

[15]  Gehan A. J. Amaratunga,et al.  Uniform patterned growth of carbon nanotubes without surface carbon , 2001 .

[16]  Arantxa Uranga,et al.  CMOS-MEMS resonators , 2015 .

[17]  Yasuo Takahashi,et al.  Room-temperature charge stability modulated by quantum effects in a nanoscale silicon island. , 2011, Nano letters.

[18]  R. E. Fontana,et al.  Technology Roadmap Comparisons for TAPE, HDD, and NAND Flash: Implications for Data Storage Applications , 2012, IEEE Transactions on Magnetics.

[19]  Lloyd C. Litt,et al.  Technology review and assessment of nanoimprint lithography for semiconductor and patterned media manufacturing , 2011 .

[20]  M. Roukes,et al.  Fabrication of high frequency nanometer scale mechanical resonators from bulk Si crystals , 1996 .

[21]  Paolo Lugli,et al.  Silicon nanowires: catalytic growth and electrical characterization , 2006 .

[22]  Jagan Singh Meena,et al.  Overview of emerging nonvolatile memory technologies , 2014, Nanoscale Research Letters.

[23]  P. Ball.  Reversing the prism , 2008 .

[24]  T. Venkatesan,et al.  Large area resist-free soft lithographic patterning of graphene. , 2013, Small.

[25]  Steve Haake,et al.  Physics, technology and the Olympics , 2000 .

[26]  A. Filoramo,et al.  High-density selective placement methods for carbon nanotubes , 2002 .

[27]  Sung-Wook Nam,et al.  Sub-10-nm nanochannels by self-sealing and self-limiting atomic layer deposition. , 2010, Nano letters.

[28]  Liping Qi,et al.  A novel 2D silicon nano-mold fabrication technique for linear nanochannels over a 4 inch diameter substrate , 2016, Scientific Reports.

[29]  D. Mamaluy,et al.  The fundamental downscaling limit of field effect transistors , 2015 .

[30]  U. Nowak,et al.  The thermodynamic limits of magnetic recording , 2012 .

[31]  J. F. Rhoads,et al.  Tunable, Dual-Gate, Silicon-on-Insulator (SOI) Nanoelectromechanical Resonators , 2012, IEEE Transactions on Nanotechnology.

[32]  J. George,et al.  Fabrication of submicrometric magnetic structures by electron-beam lithography , 1998 .

[33]  Vladimir I. Merkulov,et al.  Patterned growth of individual and multiple vertically aligned carbon nanofibers , 2000 .

[34]  N. Collaert,et al.  Review of FINFET technology , 2009, 2009 IEEE International SOI Conference.

[35]  Focused ion beams in future nanoscale probe recording , 2002 .

[36]  Hans Jurgen Richter,et al.  The transition from longitudinal to perpendicular recording , 2007 .

[37]  Fabrication of near-infrared and optical meta-materials on insulating substrates by lift-off using PMMA/Al stack , 2007 .

[38]  Yiping Zeng,et al.  Fabrication of nano-patterned sapphire substrates and their application to the improvement of the performance of GaN-based LEDs , 2008 .

[39]  Jinn-Kong Sheu,et al.  ICP etching of sapphire substrates , 2005 .

[40]  Mark Neisser,et al.  ITRS lithography roadmap: status and challenges , 2012 .

[41]  Wei Wang,et al.  Review article: Fabrication of nanofluidic devices. , 2013, Biomicrofluidics.

[42]  M. Mitchell Waldrop,et al.  The chips are down for Moore’s law , 2016, Nature.

[43]  A. Vijayaraghavan,et al.  Directed self-assembly of block copolymers for use in bit patterned media fabrication , 2013 .

[44]  Fabrication of nanoresonator biosensing arrays using nanoimprint lithography , 2012 .

[45]  Yan-Kuin Su,et al.  Pattern-size dependence of characteristics of nitride-based LEDs grown on patterned sapphire substrates , 2009 .

[46]  M. Fatih Erden,et al.  Heat Assisted Magnetic Recording , 2008, Proceedings of the IEEE.

[47]  E. Wang,et al.  Patterning Graphene with Zigzag Edges by Self‐Aligned Anisotropic Etching , 2011, Advanced materials.

[48]  Ernst J. R. Sudhölter,et al.  Silicon Nanowire-Based Devices for Gas-Phase Sensing , 2013, Sensors.

[49]  John Robertson,et al.  Growth of nanotubes for electronics , 2007 .

[50]  Haroon Ahmed,et al.  Single electron electronics: Challenge for nanofabrication , 1997 .

[51]  Efthimios Kaxiras,et al.  Graphene nanoFlakes with large spin. , 2008, Nano letters.

[52]  Jerome Mitard,et al.  Ultimate nano-electronics , 2015 .

[53]  Stephen Y. Chou,et al.  Patterned magnetic nanostructures and quantized magnetic disks , 1997, Proc. IEEE.

[54]  Yi-Ta Hsieh,et al.  Metal contact printing photolithography for fabricating sub-micrometer patterned sapphire substrates in light-emitting diodes , 2012, 2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS).

[55]  Peter van Zant.  Microchip fabrication : a practical guide to semiconductor processing , 2004 .

[56]  Y. Su,et al.  Further Improvement in the Light Output Power of InGaN-Based Light Emitting Diodes by Patterned Sapphire Substrate with KOH Wet-Chemical Etching on Sidewall , 2012 .