Optical and electrical properties of ZnO films prepared by high rate sputtering
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[1] T. Kajiwara,et al. Thermal Crystallization of Vitreous Selenium , 1982 .
[2] T. Sakai,et al. Electrical Characteristics in Al/ZnO/SiO2/Si Structure , 1982 .
[3] T. Hata,et al. High rate deposition of thick piezoelectric ZnO films using a new magnetron sputtering technique , 1980 .
[4] R. Pierret,et al. Charge injection in metal‐ZnO‐SiO2‐Si structures , 1979 .
[5] W. Westwood,et al. Guided optics techniques for investigation of films , 1979 .
[6] T. Hata,et al. High Rate Deposition of ZnO Film Using Improved DC Reactive Magnetron Sputtering Technique , 1978 .
[7] J. K. Elliott,et al. Fabrication‐related effects in metal‐ZnO‐SiO2‐Si structures , 1977 .
[8] T. Moriizumi,et al. MIS and SAW-propagation Characteristics of ZnO/Si Structures , 1976 .
[9] M. Kuhn,et al. A quasi-static technique for MOS C-V and surface state measurements , 1970 .
[10] R. J. Martin,et al. MODES OF PROPAGATING LIGHT WAVES IN THIN DEPOSITED SEMICONDUCTOR FILMS , 1969 .