Compressively strained SiGe band-to-band tunneling model calibration based on p-i-n diodes and prospect of strained SiGe tunneling field-effect transistors
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A. Hikavyy | B. Douhard | O. Richard | H. Bender | A. Thean | N. Collaert | K. Kao | R. Loo | R. Rooyackers | M. Heyns | E. Simoen | K. Meyer | A. Verhulst | W. Vandervorst | K. Arstila | J. Delmotte