Self-organized hexagonal-nanopore SERS array.

were applied for precisionnanopatterning with the advantage of high resolution withouttheneedforaphysicalmask,sincethepatterncanbechangedatany time by using computer-aided design (CAD) software.However, the disadvantages of these two methods are the longexposure time due to pixel-by-pixel scanning steps, high cost,and substantial maintenance. To overcome these limitations,phase-shift lithography,

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