Local deposition of SiOx plasma polymer films by a miniaturized atmospheric pressure plasma jet (APPJ)

An atmospheric plasma jet (APPJ, 27.17 MHz, Ar with 1% HMDSO) has been studied for the deposition of thin silicon-organic films. Jet geometries are attractive for local surface treatment or for conformal covering of 3D forms, e.g. inner walls of wells, trenches or cavities, because they are not confined by electrodes and their dimensions can be varied from several centimetres down to the sub-millimetre region. Deposition experiments have been performed on flat polymer and glass samples with a deposition rate of 0.25–23 nm s−1. The knowledge of the static deposition profile of the plasma source (footprint) is essential to allow for a controlled deposition with the source moving relative to the substrate. By adjusting the plasma parameters (RF power and gas flow) to the geometry (i.e. electrode configuration, tube diameter, relative tube position, substrate distance) the footprint can be shaped from a ring form reflecting the tube dimension to a parabolic profile. Next to the conventional stochastic mode of operation we observe a characteristic locked mode—reported here for the first time for an RF-APPJ which can improve the film deposition process distinctively. The experimental results of the local film distribution agree well with an analytical model of the deposition kinetics. The film properties have been evaluated (profilometry, XPS, FT-IR spectroscopy and SEM) for different deposition conditions and substrate distance. The FT-IR spectra demonstrate dominating SiO absorption bands, thus providing an indication for the prevailing (inorganic) SiOx character of the films. HMDSO molecules disintegrate to a sufficient degree as proved by the absence of CH2 absorption in the spectra. XPS measurements confirm the local dependence with a slightly increased organic character a few millimetres away from the maximum in the deposition profile. The substrate distance and the source direction both seem relevant and require consideration during coating of 3D objects.