Large-scale antireflective coatings on glass produced by reactive magnetron sputtering

Abstract This paper reports on AR coatings on glass manufactured by reactive sputtering employing a new mid-frequency powered magnetron source (LH TwinMag). The TwinMag realizes deposition of SiO 2 at rates of 8 nm s -1 and an outstanding long-term process stability. Stack structures consisting of four and six individual layers have been prepared by means of linear magnetrons with a length of 650 mm. On 350 x 350 mm 2 glass substrates variations of less than ±1% could be achieved for the optical thickness of the single films with a reproducibility suitable for mass production. The optical performance of different configurations using TiO 2 and Ta 2 O 5 as high refractive materials is discussed. In addition, results of tests on mechanical and chemical durability of the coatings are presented. Based upon existing data, special emphasis is laid on the discussion of manufacturing processes on an industrial scale.