Unique ESD failure mechanisms during negative to Vcc HBM tests

Abstract HBM ESD tests on two types of 0.6  μ m DRAM devices showed that internal circuit or output driver failures would occur after the input or I/O pins were ESD stressed negative with respect to Vcc at ground. These failures occurred at lower than expected ESD stress voltages due to power-up circuit interactions that either turned-on unique internal parasitic ESD current paths or disrupted the normal operation of the output pin’s ESD protection circuit. ESD analysis found there exists a set of power-up sensitive circuits and if placed near a Vcc bond pad can result in low voltage ESD failures.

[1]  Charvaka Duvvury,et al.  Substrate triggering and salicide effects on ESD performance and protection circuit design in deep submicron CMOS processes , 1995, Proceedings of International Electron Devices Meeting.

[2]  C. Duvvury,et al.  ESD Protection Reliability in 1μM CMOS Technologies , 1986, 24th International Reliability Physics Symposium.

[3]  E. Worley,et al.  Sub-micron chip ESD protection schemes which avoid avalanching junctions , 1995, Electrical Overstress/Electrostatic Discharge Symposium Proceedings.

[4]  C. Duvvury,et al.  Dynamic gate coupling of NMOS for efficient output ESD protection , 1992, 30th Annual Proceedings Reliability Physics 1992.

[5]  Kueing-Long Chen The effects of interconnect process and snapback voltage on the ESD failure threshold of NMOS transistors , 1988 .