Performance optimization of MOPA pre-pulse LPP light source
暂无分享,去创建一个
Hans Meiling | Igor V. Fomenkov | Wayne J. Dunstan | David C. Brandt | Nigel R. Farrar | Daniel J. Riggs | Slava Rokitski | Georgiy Vaschenko | Alexander A. Schafgans | Daniel J. Brown | Rick Sandstrom | Alex Ershov | Rob Rafac | Michael Purvis | Yezheng Tao | Matthew Graham | Norbert Böwering | Alberto Pirati | Noreen Harned | Christian Wagner | Ron Kool | I. Fomenkov | N. Farrar | C. Wagner | N. Harned | W. Dunstan | H. Meiling | G. Vaschenko | A. Schafgans | M. Purvis | D. Brandt | A. Ershov | Y. Tao | S. Rokitski | R. Rafac | Matthew Graham | Alberto Pirati | R. Kool | N. Böwering | D. Brown | Rick Sandstrom
[1] Imtiaz Ahmad,et al. CO2/Sn LPP EUV sources for device development and HVM , 2013, Advanced Lithography.
[2] Michael J. Lercel,et al. Light sources for EUV lithography at the 22-nm node and beyond , 2012, Advanced Lithography.
[3] Igor V. Fomenkov,et al. Performance results of laser-produced plasma test and prototype light sources for EUV lithography , 2009 .
[4] Bruno M. La Fontaine,et al. Laser produced plasma EUV sources for device development and HVM , 2012, Advanced Lithography.
[5] Igor V. Fomenkov,et al. LPP EUV source development for HVM , 2006, SPIE Advanced Lithography.
[6] Bruno M. La Fontaine,et al. LPP source system development for HVM , 2011, Advanced Lithography.