论文信息 - Plasma-Enhanced Atomic Layer Deposition Sealing Property on Extreme Low-k Film with k = 2.0 Quantified by Mass Metrology - 字舞流文

Plasma-Enhanced Atomic Layer Deposition Sealing Property on Extreme Low-k Film with k = 2.0 Quantified by Mass Metrology

G. Ditmer | N. Kobayashi | A. Nakano | A. Kobayashi | K. Matsushita | D. Ishikawa | Y. Kimura | A. Kiermasz