Ion-assisted deposition of yttrium fluoride as a substitute for thorium fluoride: application to infrared antireflection coating on germanium

Yttrium fluoride has been proposed as a substitute for thorium fluoride in anti-reflection coatings for the infrared range. We have studied the ion assisted deposition (IAD) of YF3 in order to obtain dense and low absorbency layers in the 8 to 12 mm spectral window. Refractive index and extinction coefficient of this fluoride were determined from spectrophotometry measurements. We have then associated the YF3 with ZnS and Ge layers so as to obtain four layer anti-reflection coatings on germanium. The stress induced by each layer in the coating was measured and the sum was shown to be equal to the stress of the total coating. Eventually, an industrial, high efficiency, both side anti-reflection coating on germanium was developed using IAD YF3 film.