A 920 gate DSA MOS masterslice

A DSA MOS (diffusion self-aligned MOS) masterslice circuit with up to 920 gates and a delay of 3 ns per gate has been developed for random logic computer circuits, utilizing the performance and economical advantages of the LSI masterslice approach. To attain high packing density and high speed with conventional design rules, the DSA MOSFET technology has been used for the basic device. The chip comprises 50 by 16 gate cells and 116 input/output buffers. This LSI chip is two to three times better than bipolar S-TTL in packing density and is comparable in propagation delay time. As an example of an LSI device obtained through customized metallization, an 8 bit ALU is described which has an average delay time of 3 ns and a power dissipation of 3 W.

[1]  Yutaka Hayashi,et al.  Diffusion Selfaligned MOST; A New Approach for High Speed Device , 1969 .

[2]  Yutaka Hayashi,et al.  Fully Ion Implanted DSA MOS IC , 1976 .

[3]  O. Tomisawa,et al.  A 920 gate masterslice , 1978, 1978 IEEE International Solid-State Circuits Conference. Digest of Technical Papers.

[4]  Y. Tarui,et al.  Fully ion implanted 4096-bit high speed DSA MOS RAM , 1977, 1977 IEEE International Solid-State Circuits Conference. Digest of Technical Papers.

[5]  Tsuneta Sudo,et al.  A Subnanosecond Masterslice LSI Using Dielectric Isolation and Three Layer Metallization Technologies , 1978 .