Polymer-confined colloidal monolayer: a reusable soft photomask for rapid wafer-scale nanopatterning.
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M. Fang | J. Ho | Fei Xiu | Hao Lin | Senpo Yip | Chun‐Yuen Wong | E. Pun | L. Shen | Ho‐Yuen Cheung
暂无分享,去创建一个
M. Fang | J. Ho | Fei Xiu | Hao Lin | Senpo Yip | Chun‐Yuen Wong | E. Pun | L. Shen | Ho‐Yuen Cheung