论文信息 - Low energy lithography; energy control and variable energy exposure - 字舞流文

Low energy lithography; energy control and variable energy exposure

Rainer Plontke | Ernst-Bernhard Kley | Bernd Schnabel | Ines Stolberg | E. Kley | B. Schnabel | W. Brünger | Wilhelm H. Brünger | Matthias Zierbock | I. Stolberg | Matthias Zierbock | R. Plontke | R. Plontke | M. Zierbock

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[2] E. Kratschmer,et al. Verification of a proximity effect correction program in electron‐beam lithography , 1981 .