论文信息 - Plasma Assisted Deposition of Metal Fluoride Coatings

Plasma Assisted Deposition of Metal Fluoride Coatings

Most of the common metal fluorides were deposited by plasma-assisted electron beam evaporation. Coatings with high packing density and low extinction coefficient could be produced. The advantages in comparison to conventional deposition techniques are discussed.

Dieter Gäbler | Norbert Kaiser | Martin Bischoff

[1] Akira Tanaka,et al. Optical properties of fluoride thin films deposited by RF magnetron sputtering. , 2006, Applied optics.

[2] G. Atanassov,et al. Mechanical, optical and structural properties of TiO2 and MgF2 thin films deposited by plasma ion assisted deposition , 1999 .

[3] Cheng-chung Lee,et al. Microstructure related properties of lanthanum fluoride films deposited by molybdenum boat evaporation at 193 nm , 2005 .

[4] Dieter Gäbler,et al. Metal fluoride coatings prepared by ion-assisted deposition , 2008, Optical Systems Design.

[5] Angela Duparré,et al. Ultraviolet optical and microstructural properties of MgF2 and LaF3 coatings deposited by ion-beam sputtering and boat and electron-beam evaporation. , 2002, Applied optics.

[6] Cheng-Chung Lee,et al. Microstructure-related properties at 193 nm of MgF2 and GdF3 films deposited by a resistive-heating boat. , 2006, Applied optics.