Thermal bleaching of x-ray-induced defect centers in high purity fused silica by diffusion of radiolytic molecular hydrogen

Isochronal and isothermal anneal curves are presented for paramagnetic defect centers in high purity Type III (1200 ppm OH) fused silicas which had been y irradiated. Successful mathematical fits to the data were achieved by means of a modified second order kinetic theory formulation under the operating hypothesis that E’ centers are annealed in the temperature range 500–700K by reaction with radiolytically-formed interstitial water molecules. Thus, H2O becomes the third small molecule (after O2 and H2) recently demonstrated to account for the thermal bleaching of radiation-induced defect centers in amorphous silica by diffusion-limited processes. Significant dependences of the annealing behavior on γ-ray dose and time after irradiation are reported and discussed in the context of the H2O diffusional model. Finally, it is emphasized that removal of the paramagnetic centers by this mechanism would leave behind an ensemble of charged, diamagnetic defects which could be reactivated by subsequent irradiations unless care is taken to remove them by higher temperature anneals.

[1]  G. Caporaso,et al.  Must ultrabaric matter be superluminal , 1979 .

[2]  R. Devine.  Mechanisms of damage recovery in ion implanted SiO2 , 1984 .

[3]  E. J. Friebele,et al.  Optical fiber waveguides in radiation environments, II , 1984 .

[4]  E. Friebele,et al.  Radiation damage of optical fiber waveguides at long wavelengths. , 1982, Applied optics.

[5]  D. M. Yudin,et al.  Hyperfine interactions in high-silicate and quartz glasses , 1975 .

[6]  R. A. Cox,et al.  Evaluated kinetic and photochemical data for atmospheric chemistry: Volume III - gas phase reactions of inorganic halogens , 2006 .

[7]  E. Friebele,et al.  Oxygen-associated trapped-hole centers in high-purity fused silicas , 1979 .

[8]  J. Shelby.  Reaction of hydrogen with hydroxyl‐free vitreous silica , 1980 .

[9]  E. Friebele,et al.  Fundamental defect centers in glass : The peroxy radical in irradiated high-purity fused silica , 1979 .

[10]  R. Weeks,et al.  Trapped Electrons in Irradiated Quartz and Silica: II, Electron Spin Resonance , 1960 .

[11]  J. E. Shelby,et al.  Radiation effects in hydrogen‐impregnated vitreous silica , 1979 .

[12]  W. Brandt.  Use of percolation theory to estimate effective diffusion coefficients of particles migrating on various ordered lattices and in a random network structure , 1975 .

[13]  E. Paige,et al.  CXI. The optical effects of radiation induced atomic damage in quartz , 1956 .

[14]  R. A. Weeks,et al.  Paramagnetic Resonance of Lattice Defects in Irradiated Quartz , 1956 .

[15]  D. Griscom.  E' center in glassy SiO 2 : Microwave saturation properties and confirmation of the primary 29 Si hyperfine structure , 1979 .

[16]  E. J. Friebele,et al.  Drawing‐induced defect centers in a fused silica core fiber , 1976 .

[17]  J. Shelby.  Temperature Dependence of He Diffusion in Vitreous SiC2 , 1971 .

[18]  W. Primak.  Stress relaxation in unirradiated and in helium ion bombarded glass plates: Dimensional stability , 1984 .

[19]  A. Edwards,et al.  Theory of the peroxy-radical defect in a -Si O 2 , 1982 .

[20]  F. Freund,et al.  A deuterium-hydrogen fractionation mechanism in magnesium oxide , 1982 .

[21]  W. Fowler,et al.  Electronic structure of E 1 ' centers in SiO 2 , 1975 .

[22]  David L. Griscom,et al.  Defect structure of glasses: Some outstanding questions in regard to vitreous silica , 1985 .

[23]  D. Griscom.  Characterization of three E'-center variants in X- and γ-irradiated high purity a-SiO2 , 1984 .

[24]  E. P. EerNisse,et al.  Introduction rates and annealing of defects in ion‐implanted SiO2 layers on Si , 1974 .

[25]  R. Devine,et al.  Creation and annealing kinetics of magnetic oxygen vacancy centers in SiO2 , 1983 .

[26]  A. Sosin,et al.  Defect mobility and reaction: Diffusional and rate theory formulations in one and three dimensions , 1970 .

[27]  D. Roy,et al.  Dissolution of Hydrogen in Fused Silica , 1971 .

[28]  C. Dozier,et al.  Effect of Photon Energy on the Response of MOS Devices , 1981, IEEE Transactions on Nuclear Science.

[29]  W. Brandt.  Solubilities and diffusion coefficients of inert gases in inorganic glasses. Comparison based on percolation theorie , 1975 .

[30]  E. Friebele,et al.  Fundamental defect centers in glass: Si 29 hyperfine structure of the nonbridging oxygen hole center and the peroxy radical in a -Si O 2 , 1981 .

[31]  Y. Negishi,et al.  Infra-red optical loss increase for silica fibre in cable filled with water , 1983 .

[32]  George W. Arnold,et al.  Radiation Effects in Silica at Low Temperatures , 1959 .

[33]  A. Stesmans,et al.  Electron spin resonance study of defects in Si‐SiO2 structures induced by As+ ion implantation , 1984 .

[34]  A. G. Revesz,et al.  Defect Structure and Irradiation Behavior of Noncrystalline SiO2 , 1971 .

[35]  Y. Koyamada,et al.  Optical loss increase of phosphor‐doped silica fiber at high temperature in the long wavelength region , 1983 .

[36]  S. J. Stannard-Powell,et al.  Attenuation changes in optical fibres due to hydrogen , 1983 .

[37]  E. J. Friebele,et al.  ESR studies of damage processes in X‐irradiated high purity a‐SiO2:OH and characterization of the formyl radical defect , 1983 .

[38]  D. Griscom.  Electron spin resonance studies of trapped hole centers in irradiated alkali silicate glasses: A critical comment on current models for HC1 and HC2 , 1984 .

[39]  E. Friebele,et al.  Radiation-resistant low OH content silica core fibers , 1983 .

[40]  W. Primak.  Stress relaxation in electron bombarded silicate glasses , 1984 .

[41]  T. Waite,et al.  Theoretical Treatment of the Kinetics of Diffusion-Limited Reactions , 1957 .

[42]  A R Chraplyvy,et al.  Gas-in-glass-a new Raman-gain medium: molecular hydrogen in solid-silica optical fibers. , 1982, Optics letters.

[43]  A. J. Cohen.  IMPURITY INDUCED COLOR CENTERS IN FUSED SILICA , 1955 .

[44]  R. A. Weeks,et al.  Trapped Electrons in Irradiated Quartz and Silica: I, Optical Absorption , 1960 .

[45]  J. E. Shelby,et al.  Molecular diffusion and solubility of hydrogen isotopes in vitreous silica , 1977 .

[46]  J. Shelby.  Helium Migration in Natural and Synthetic Vitreous Silica , 1972 .

[47]  E. Friebele.  Optical Fiber Waveguides In Radiation Environments , 1979 .

[48]  E. Friebele,et al.  Photobleaching effects in optical fiber waveguides. , 1981, Applied optics.

[49]  Thermal Annealing of Radiation Induced Defects: A Diffusion-Limited Process? , 1983, IEEE Transactions on Nuclear Science.

[50]  W. Fowler,et al.  Oxygen vacancy model for the E1′ center in SiO2 , 1974 .

[51]  J. Vitko,et al.  ESR studies of hydrogen hyperfine spectra in irradiated vitreous silica , 1978 .

[52]  F. Freund,et al.  Pre-irradiation defects in “pure” MgO associated with hydrogen, carbon and peroxy configurations , 1984 .

[53]  J. E. Shelby,et al.  Radiation‐induced isotope exchange in vitreous silica , 1979 .

[54]  D. M. Roy,et al.  Irradiation Effects in Glasses: Suppression by Synthesis under High-Pressure Hydrogen , 1967, Science.

[55]  W. Primak.  Stress relaxation of vitreous silica on irradiation , 1982 .

[56]  C. Hartwig.  The radiation‐induced formation of hydrogen and deuterium compounds in silica as observed by Raman scattering , 1977 .

[57]  B. Henderson,et al.  Defects in crystalline solids , 1972 .

[58]  S. C. Keeton,et al.  Temperature dependence of gas diffusion in glass , 1974 .

[59]  E. J. Friebele,et al.  Observation and analysis of the primary 29Si hyperfine structure of the E′ center in non-crystalline SiO2 , 1974 .

[60]  J. D. Rush,et al.  Increased attenuation in optical fibres caused by diffusion of molecular hydrogen at room temperature , 1983 .

[61]  W. D. Compton,et al.  Radiation effects in fused silica and α-Al2O3 , 1961 .

[62]  L. Skuja,et al.  Spectroscopic properties and mutual conversion reactions of quasimolecular hydroxyl and non-bridging oxygen defects in vitreous silica , 1980 .

[63]  Yoshinori Namihira,et al.  Transmission loss increase in optical fibres due to hydrogen permeation , 1983 .