Multilayer optics to be used as FEL fundamental suppressors for harmonics selection

Abstract Pump and probe experiments are one of the most attractive and powerful tools offered by a free electron laser facility. In these experiments it is fundamental to pump the system with a particular wavelength (usually the fundamental one) and to probe it with a second wavelength (e.g. higher emitted harmonics). Radiation emitted at the fundamental wavelength is 100 or more times the number of photons emitted in higher harmonics; selection of higher harmonics can be therefore critical. Multilayer (ML) mirrors that are able to provide high reflectivity peak at the desired harmonic wavelength while rejecting the fundamental have been designed and their application is foreseen to the FERMI@Elettra FEL beam transport system. The photon beam will be split into two and one of these will pass through a set of ML mirrors optimized for third harmonics selection; this scheme is also useable to realize a delay line in which the few nanosecond time delay will be controlled by changing the mirrors distance. A set of target wavelengths has been considered and multilayer structure materials have been selected. The MLs have been designed using a method based on the control of standing wave distribution at the fundamental and third harmonics wavelength, using a capping layer as a key element to achieve the willing rejection. Fabrication and test of such structures are foreseen.

[1]  Piergiorgio Nicolosi,et al.  High performance EUV multilayer structures insensitive to capping layer optical parameters. , 2008, Optics express.

[2]  C. Falco,et al.  Optical constants of in situ-deposited films of important extreme-ultraviolet multilayer mirror materials. , 1998, Applied optics.

[3]  Richard A. London,et al.  Femtosecond time-delay X-ray holography , 2007, Nature.

[4]  D Giuressi,et al.  The photon analysis, delivery, and reduction system at the FERMI@Elettra free electron laser user facility. , 2009, The Review of scientific instruments.

[5]  Piergiorgio Nicolosi,et al.  Innovative methods for optimization and characterization of multilayer coatings , 2009, Optics + Optoelectronics.

[6]  H. Wabnitz,et al.  The soft x-ray free-electron laser FLASH at DESY: beamlines, diagnostics and end-stations , 2009 .

[7]  Katsumi Midorikawa,et al.  Focusing coherent soft-x-ray radiation to a micrometer spot size with an intensity of 10(14) W/cm2. , 2004, Optics letters.

[8]  Piergiorgio Nicolosi,et al.  Realization and characterization of an XUV multilayer coating for attosecond pulses. , 2009, Optics express.

[9]  E. D. van Hattum,et al.  Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure. , 2010, Optics express.

[10]  Sherry L. Baker,et al.  Oxidation resistance of Ru-capped EUV multilayers , 2005, SPIE Advanced Lithography.

[11]  Piergiorgio Nicolosi,et al.  Extreme-ultraviolet multilayer coatings with high spectral purity for solar imaging. , 2009, Applied optics.

[12]  S. Bajt,et al.  Properties of ultrathin films appropriate for optics capping layers exposed to high energy photon irradiation , 2008 .

[13]  H. Chapman,et al.  Soft x-ray free electron laser microfocus for exploring matter under extreme conditions. , 2009, Optics express.

[14]  David L. Windt,et al.  IMD—software for modeling the optical properties of multilayer films , 1998 .

[15]  M. Richter,et al.  Photoelectric effect at ultrahigh intensities. , 2007, Physical review letters.

[16]  Daniele Cocco,et al.  The FERMI@Elettra free-electron-laser source for coherent x-ray physics: photon properties, beam transport system and applications , 2010 .