Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment

[1]  M. Niranjan.  Theoretical investigation of surface states and energetics of PtSi surfaces , 2016 .

[2]  H. Mizuseki,et al.  The Schottky barrier modulation at PtSi/Si interface by strain and structural deformation , 2015 .

[3]  D. Jeong,et al.  Control of the initial growth in atomic layer deposition of Pt films by surface pretreatment , 2015, Nanotechnology.

[4]  Hanchul Kim,et al.  Suppression of phonon transport in multiple Si/PtSi heterostructures , 2015 .

[5]  W. Hwang,et al.  Formation of PtSi Schottky barrier MOSFETs using plasma etching , 2015 .

[6]  S. Bent,et al.  Effect of O3 on Growth of Pt by Atomic Layer Deposition , 2014 .

[7]  Virginia R. Anderson,et al.  Atomic Layer Deposition of Platinum Nanoparticles on Titanium Oxide and Tungsten Oxide Using Platinum(II) Hexafluoroacetylacetonate and Formalin as the Reactants , 2014 .

[8]  J. Ho,et al.  Single InAs nanowire room-temperature near-infrared photodetectors. , 2014, ACS nano.

[9]  S. Dayeh,et al.  Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing , 2013 .

[10]  S. George,et al.  Growth of continuous and ultrathin platinum films on tungsten adhesion layers using atomic layer deposition techniques , 2012 .

[11]  R. Wolters,et al.  On the kinetics of platinum silicide formation , 2011 .

[12]  D. King,et al.  Highly dispersed Pt nanoparticle catalyst prepared by atomic layer deposition , 2010 .

[13]  Seung Min Kim,et al.  Genesis and Evolution of Surface Species during Pt Atomic Layer Deposition on Oxide Supports Characterized by in Situ XAFS Analysis and Water−Gas Shift Reaction , 2010 .

[14]  M. Ritala,et al.  Atomic Layer Deposition of Platinum Oxide and Metallic Platinum Thin Films from Pt(acac)2 and Ozone , 2008 .

[15]  S. Demuynck,et al.  Failure mechanisms of PVD Ta and ALD TaN barrier layers for Cu contact applications , 2007 .

[16]  M. Ritala,et al.  Atomic Layer Deposition of Platinum Thin Films , 2003 .

[17]  S. Alterovitz,et al.  Spectroscopic ellipsometry studies of HF treated Si (100) surfaces , 1993 .

[18]  M. Grundner,et al.  Investigations on hydrophilic and hydrophobic silicon (100) wafer surfaces by X-ray photoelectron and high-resolution electron energy loss-spectroscopy , 1986 .

[19]  E. J. Lloyd,et al.  High temperature stability of PtSi formed by reaction of metal with silicon or by cosputtering , 1983 .

[20]  Cigang Xu,et al.  Nucleation and Growth of Platinum Films on High-k/Metal Gate Materials by Remote Plasma and Thermal ALD , 2012 .

[21]  C. Detavernier,et al.  Plasma-Enhanced ALD of Platinum with O2, N2 and NH3 Plasmas , 2012 .

[22]  R. Hicks,et al.  Organometallic chemical vapor deposition of platinum. Reaction kinetics and vapor pressures of precursors , 1992 .

[23]  W. Kern.  Cleaning solutions based on hydrogen peroxide for use in silicon semiconductor technology , 1970 .