论文信息 - A scalable and highly manufacturable single metal gate/high-k CMOS integration for sub-32nm technology for LSTP applications - 字舞流文

A scalable and highly manufacturable single metal gate/high-k CMOS integration for sub-32nm technology for LSTP applications

D. Gilmer | G. Bersuker | P. Kirsch | K. Tateiwa | R. Jammy | C. Park | H. Tseng | P. Lysaght | J. Huang | C. Park | C. Young | D. Heh | H. Park | K. Rader | J. Price | M. Hussain | M. Cruz