论文信息 - High aspect ratio air core solenoid inductors using an improved UV-LIGA process with contrast enhancement material - 字舞流文

High aspect ratio air core solenoid inductors using an improved UV-LIGA process with contrast enhancement material

Jeong-Bong Lee | Hong Lu | Jong-Chan Lee | Brandon Pillans | Kyunghwan Kim | B. Pillans | Jeong-Bong (JB) Lee | Hong M. Lu | Kyunghwan Kim | Jong-Chan Lee

[1] Warren W. Flack,et al. Contrast enhancement materials for thick photoresist applications , 2004, SPIE Advanced Lithography.

[2] David K. Fork,et al. Out-of-plane high-Q inductors on low-resistance silicon , 2003 .

[3] Jeong-Bong (JB) Lee,et al. Surface micromachined arch-shape on-chip 3-D solenoid inductors for high-frequency applications , 2003 .

[4] Jian Zhang,et al. Polymerization optimization of SU-8 photoresist and its applications in microfluidic systems and MEMS , 2001 .

[5] Rinaldo Castello,et al. Measurement and modeling of Si integrated inductors , 1998, IEEE Trans. Instrum. Meas..

[6] Peter Vettiger,et al. High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS , 1998 .

[7] M. Despont,et al. SU-8: a low-cost negative resist for MEMS , 1997 .

[8] Mark G. Allen,et al. Surface micromachined solenoid inductors for high frequency applications , 1997 .

[9] M. Mehregany,et al. High-aspect-ratio photolithography for MEMS applications , 1995 .

[10] S. Wind,et al. Resist contrast enhancement in high resolution electron beam lithography , 1989 .

[11] Chris A. Mack,et al. Contrast enhancement techniques for submicron optical lithography , 1987 .

[12] Masaru Sasago,et al. Study of half‐micron photolithography by means of contrast enhanced lithography process , 1987 .

[13] L. Halle. A water soluble contrast enhancement layer , 1985 .