Optimization of Metal‐Organic Chemical Vapor Deposition Regrown n‐GaN
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O. Ambacher | M. Prescher | L. Kirste | R. Quay | S. Leone | Philipp Doering | Theodor Fuchs | P. Brueckner | Stefan Mueller
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O. Ambacher | M. Prescher | L. Kirste | R. Quay | S. Leone | Philipp Doering | Theodor Fuchs | P. Brueckner | Stefan Mueller