Characteristics of relief phase holograms recorded in photoresists.

Recording of relief phase holograms in Shipley AZ-1350 positive photoresist is investigated in this report. It is found that the use of Shipley AZ-303 developer with Shipley AZ-1350 photoresist relieves the material nonlinearity usually associated with photoresists, thereby allowing higher image readout efficiencies. The use of Shipley AZ-303 developer also provides an increase in material sensitivity. A theoretical model for positive photoresist exposure characteristics is developed and verified by empirical results. Using Shipley AZ-303 developer, a design procedure for recording useful (i.e., acceptable SNR > 25 dB, high efficiency ~3-5%, exposure sensitivity ~ a few mJ.cm(-2)) relief phase holograms in Shipley AZ-1350 positive photoresist is synthesized.

[1]  H. J. Gerritsen,et al.  Elimination of speckle noise in holograms with redundancy. , 1968, Applied optics.

[2]  Chih-Tang Sah,et al.  Thermal emission and capture of electrons at sulfur centers in silicon , 1970 .

[3]  R. Meier,et al.  Properties and limitations of hologram recording materials. , 1969, Applied optics.

[4]  Wai-Hon Lee,et al.  Noise Characteristics of Photographic Emulsions Used for Holography , 1971 .

[5]  Barret Broyde.  Exposure of Photoresists II . Electron and Light Exposure of a Positive Photoresist , 1970 .

[6]  L. Lin.  Method of Characterizing Hologram-Recording Materials* , 1971 .

[7]  E. Leith,et al.  Reconstructed Wavefronts and Communication Theory , 1962 .

[8]  F. Smits,et al.  The use of an interference microscope for measurement of extremely thin surface layers , 1956 .

[9]  H. Dammann,et al.  Phase Holograms of Diffuse Objects , 1970 .

[10]  M. Lurie,et al.  Embossed hologram motion pictures for television playback. , 1970, Applied Optics.

[11]  M. Beesley,et al.  The use of photoresist as a holographic recording medium. , 1970, Applied optics.

[12]  John B. DeVelis,et al.  Image Reconstruction with Fraunhofer Holograms , 1966 .

[13]  R. Bartolini,et al.  Improved development for holograms recorded in photoresist. , 1972, Applied optics.

[14]  W. Cathey.  Spatial Phase Modulation of Wavefronts in Spatial Filtering and Holography , 1966 .

[15]  D. Gabor.  Microscopy by reconstructed wave-fronts , 1949, Proceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences.

[16]  J A Jenney.  Nonlinearities of photopolymer holographic recording materials. , 1972, Applied optics.