A Low-Leakage Epitaxial High-κ Gate Oxide for Germanium Metal-Oxide-Semiconductor Devices.
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E. Yu | A. Demkov | Chengqing Hu | J. Ekerdt | Martin D. McDaniel | A. Posadas | A. Jiang
暂无分享,去创建一个
E. Yu | A. Demkov | Chengqing Hu | J. Ekerdt | Martin D. McDaniel | A. Posadas | A. Jiang