Suppressed variability of current-onset voltage of FinFETs by improvement of work function uniformity of metal gates
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K. Endo | Y. Morita | W. Mizubayashi | S. Migita | T. Matsukawa | S. O'Uchi | Y. Liu | M. Masahara | H. Ota | H. Yamauchi | Y. Ishikawa | J. Tsukada