Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
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A. Mantoux | M. Pons | C. Vallée | E. Blanquet | C. Jiménez | G. Giusti | L. Rapenne | S. Ponton | F. Volpi | L. Tian | A. Crisci | R. Reboud | M. Benz | Roman Reboud