论文信息 - Lithography simulation employing rigorous solutions to Maxwell's equations

Lithography simulation employing rigorous solutions to Maxwell's equations

A method of obtaining rigorous solutions to Maxwell's equations for the transmission of light through a photomask, both chrome-based and phase-shifting, is presented. The electromagnetic simulator will predict the transmission of light through the mask taking into account material properties, width, and thickness of the structures on the mask. This electromagnetic simulation will then be incorporated into the software package PROLITH/2 for complete simulation down to the resist level. Examples of lithography simulation using these rigorous solutions will be presented.

Ronald L. Gordon | Chris A. Mack | R. L. Gordon | C. Mack

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