Atomic resolution imaging of Si(1 0 0)1×1:2H dihydride surface with noncontact atomic force microscopy (NC-AFM)
暂无分享,去创建一个
[1] Y. Mori,et al. Atomic structures of hydrogen-terminated Si(001) surfaces after wet cleaning by scanning tunneling microscopy , 1998 .
[2] M. Tsukada,et al. Long-range structures on the dihydride Si(001) surface , 1998 .
[3] Peter Nordlander,et al. Breaking individual chemical bonds via STM-induced excitations , 1996 .
[4] Y. Morita,et al. Atomic scale flattening and hydrogen termination of the Si(001) surface by wet-chemical treatment , 1996 .
[5] J R Tucker,et al. Atomic-Scale Desorption Through Electronic and Vibrational Excitation Mechanisms , 1995, Science.
[6] Y. Koide,et al. Relationship between growth processes and strain relaxation in Si1−xGex films grown on (100)Si‐(2×1) surfaces by gas source molecular beam epitaxy , 1993 .
[7] J. Boland. Role of bond-strain in the chemistry of hydrogen on the Si(100) surface , 1992 .
[8] Y. Morita,et al. Atomic Structure of Hydrogen-Terminated Si(111) Surfaces by Hydrofluoric Acid Treatments , 1991 .
[9] Boland,et al. Evidence of pairing and its role in the recombinative desorption of hydrogen from the Si(100)-2 x 1 surface. , 1991, Physical review letters.
[10] Y. Morita,et al. Direct observation of SiH3 on a 1%‐HF‐treated Si(111) surface by scanning tunneling microscopy , 1991 .
[11] S. Gates,et al. Decomposition of silane on Si(111)‐(7×7) and Si(100)‐(2×1) surfaces below 500 °C , 1990 .
[12] Tsuneo Ajioka,et al. Effects of surface hydrogen on the air oxidation at room temperature of HF‐treated Si (100) surfaces , 1990 .