Multi-Resistance Wide-Range Standard for the Calibration of Conductive probe Atomic Force Microscopy Measurements

Measuring resistances at the nanoscale has attracted recent attention for developing microelectronic components, memory devices, molecular electronics, and two-dimensional materials. Despite the decisive contribution of scanning probe microscopy in imaging resistance and current variations, measurements have remained restricted to qualitative comparisons. Reference resistance standards are key to advancing the research-to-manufacturing process of nanoscale devices and materials through calibrated, reliable