DOE/Opt: a system for design of experiments, response surface modeling, and optimization using process and device simulation
暂无分享,去创建一个
[1] Art B. Owen,et al. Using simulators to model transmitted variability in IC manufacturing , 1989 .
[2] Andrzej J. Strojwas,et al. A CFD Model for the Pecvd of Silicon Nitride , 1993, Proceedings. IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop.
[3] John K. Ousterhout,et al. An X11 Toolkit Based on the Tcl Language , 1991, USENIX Winter.
[4] S. Nassif,et al. Developing and Integrating TCAD Applications with the Semiconductor Wafer Representation , 1992, NUPAD IV. Workshop on Numerical Modeling of Processes and Devices for Integrated Circuits,.
[5] Dennis L. Young,et al. Application of statistical design and response surface methods to computer-aided VLSI device design , 1988, IEEE Trans. Comput. Aided Des. Integr. Circuits Syst..
[6] Ping Yang,et al. The determination of SPICE Gummel-Poon parameters by a merged optimization-extraction technique , 1989, Proceedings of the Bipolar Circuits and Technology Meeting.
[7] N. Draper,et al. Applied Regression Analysis , 1966 .
[8] T. J. Sanders,et al. Integrated circuit design for manufacturing through statistical simulation of process steps , 1992 .
[9] Duane S. Boning,et al. Transistor design with TCAD tuning and device optimization for process/device synthesis , 1993, 1993 International Symposium on VLSI Technology, Systems, and Applications Proceedings of Technical Papers.
[10] A. J. Strojwas. The process engineer's workbench , 1988 .
[11] R.W. Dutton,et al. VLSI Process modeling—SUPREM III , 1983, IEEE Transactions on Electron Devices.
[12] A. Owen. Controlling correlations in latin hypercube samples , 1994 .
[13] John K. Ousterhout,et al. Tcl: An Embeddable Command Language , 1989, USENIX Winter.
[14] S.W. Director,et al. An efficient macromodeling approach for statistical IC process design , 1988, [1988] IEEE International Conference on Computer-Aided Design (ICCAD-89) Digest of Technical Papers.
[15] Sani R. Nassif,et al. FABRICS II: A Statistically Based IC Fabrication Process Simulator , 1984, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems.
[16] Mark R. Simpson. PRIDE: an integrated design environment for semiconductor device simulation , 1991, IEEE Trans. Comput. Aided Des. Integr. Circuits Syst..
[17] Jack A. Mandelman,et al. The use of simulation in semiconductor technology development , 1990 .
[18] S. Saxena,et al. A Monitor Wafer Based Controller For Pecvd Silicon Nitride Process On Amt 5000 , 1993, Proceedings. IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop.
[19] Steven G. Duvall,et al. EASE--An Application-Based CAD System for Process Design , 1987, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems.
[20] S.S. Mahant-Shetti,et al. Statistical Modeling for Efficient Parametric Yield Estimation of MOS VLSI Circuits , 1985, IEEE Journal of Solid-State Circuits.
[21] Ronald L. Iman,et al. A FORTRAN-77 PROGRAM AND USER'S GUIDE FOR THE GENERATION OF LATIN HYPERCUBE AND RANDOM SAMPLES FOR USE WITH COMPUTER MODELS , 1984 .
[22] Genichi Taguchi,et al. Quality Engineering through Design Optimization , 1989 .
[23] Duane S. Boning,et al. An Integrated Technology CAD System for Process and Device Designers , 1993, The Sixth International Conference on VLSI Design.
[24] K. M. Cham,et al. Computer-Aided Design and VLSI Device Development , 1985 .
[25] G. Box,et al. On the Experimental Attainment of Optimum Conditions , 1951 .