论文信息 - Silicon and Silicon dioxide thin films deposited by ICPCVD at low temperature and high rate for MEMS applications - 字舞流文

Silicon and Silicon dioxide thin films deposited by ICPCVD at low temperature and high rate for MEMS applications

A. Keating | K. Silva | L. Faraone | G. Putrino | M. Martyniuk | D. Tripathi | D. K. Tripathi | Praveen K. Revuri | P. K. Revuri