Modifications of Low Dielectric Constant Fluorinated Amorphous Carbon Films by Multiple Plasma Treatments
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Jia-Min Shieh | Bau-Tong Dai | Shih-Chin Lee | Chih-Hung Ying | J. Shieh | Yanqiang Fang | B. Dai | Shih-chin Lee | Kou-Chiang Tsai | Yan-Kun Fang | K. Tsai | Chih-Hung Ying
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