Moving mask LIGA (M/sup 2/LIGA) process for control of side wall inclination

The side wall inclination of a PMMA microstructure fabricated by deep X-ray lithography has been controlled by moving an X-ray mask in parallel with a PMMA substrate during X-ray exposure. In order to demonstrate the feasibility of this moving mask technology, various conical shape and truncated conical shape microstructures with height of 100-300 /spl mu/m and a diameter of the top and the bottom of truncated conical structures between 0-310 /spl mu/m were fabricated.