Characterization of 1064nm nanosecond laser-induced damage on antireflection coatings grown by atomic layer deposition.

Damage tests are carried out at 1064nm to measure the laser resistance of TiO(2)/Al(2)O(3) and HfO(2)/Al(2)O(3) antireflection coatings grown by atomic layer deposition (ALD). The damage results are determined by S-on-1 and R-on-1 tests. Interestingly, the damage performance of ALD coatings is similar to those grown by conventional e-beam evaporation process. A decline law of damage resistance under multiple irradiations is revealed. The influence of growth temperature on damage performance has been investigated. Result shows that the crystallization of TiO(2) layer at higher temperature could lead to numerous absorption defects that reduce the laser-induced damage threshold (LIDT). In addition, it has been found that using inorganic compound instead of organic compound as precursors for ALD process maybe effectively prevent carbon impurities in films and will increase the LIDT obviously.

[1]  Jean DiJon,et al.  Nano absorbing centers: a key point in the laser damage of thin films , 1997, Laser Damage.

[2]  Mikko Ritala,et al.  Atomic layer epitaxy—a valuable tool for nanotechnology? , 1999 .

[3]  Thomas E. Seidel,et al.  Thin film atomic layer deposition equipment for semiconductor processing , 2002 .

[4]  C Amra,et al.  Statistical study of single and multiple pulse laser-induced damage in glasses. , 2002, Optics express.

[5]  Takahisa Jitsuno,et al.  Large-Area Optical Coatings with Uniform Thickness Grown by Surface Chemical Reactions for High-Power Laser Applications , 2002 .

[6]  Edward I. Moses,et al.  The National Ignition Facility: the world's largest optics and laser system , 2003, SPIE LASE.

[7]  Takahisa Jitsuno,et al.  Laser Damage Properties of Optical Coatings with Nanoscale Layers Grown by Atomic Layer Deposition , 2004 .

[8]  A. Melninkaitis,et al.  Multiple pulse laser-induced damage of antireflection coated lithium triborate , 2005, SPIE Optical Systems Design.

[9]  Jianhua Liu,et al.  Scaling laws of femtosecond laser pulse induced breakdown in oxide films , 2005 .

[10]  W. Song,et al.  Encapsulation of low-refractive-index SiO(2) nanorods by Al(2)O(3) with atomic layer deposition. , 2007, Optics express.

[11]  Nemo Biluš Abaffy,et al.  Multilayer alumina and titania optical coatings prepared by atomic layer deposition , 2008, NanoScience + Engineering.

[12]  Norbert Kaiser,et al.  Atomic layer deposition process with TiF4 as a precursor for depositing metal fluoride thin films. , 2008, Applied optics.

[13]  S. Papernov,et al.  Laser-induced surface damage of optical materials: absorption sources, initiation, growth, and mitigation , 2008, Laser Damage.

[14]  Luke A. Emmert,et al.  The role of native and photoinduced defects in the multi-pulse subpicosecond damage behavior of oxide films , 2008, Laser Damage.

[15]  Adriana Szeghalmi,et al.  Atomic layer deposition of Al2O3 and TiO2 multilayers for applications as bandpass filters and antireflection coatings. , 2009, Applied optics.

[16]  Ivan Avrutsky,et al.  Optical properties of Al2O3 thin films grown by atomic layer deposition. , 2009, Applied optics.

[17]  Jonathan W. Arenberg Life testing for laser optics: a first look , 2009, Laser Damage.

[18]  Wolfgang Riede,et al.  S on 1 testing of AR and HR designs at 1064nm , 2010, Laser Damage.

[19]  Jarmo Maula Atomic layer deposition (ALD) for optical nanofabrication , 2010, MOEMS-MEMS.

[20]  Xu Qiao Laser damage properties of thin films grown by atomic layer deposition , 2011 .

[21]  Hongfei Jiao,et al.  Comparative study of Laser induce damage of HfO2/SiO2 and TiO2/SiO2 mirrors at 1064 nm. , 2011, Optics express.

[22]  Denny Wernham,et al.  An empirical investigation of the laser survivability curve: V , 2010, Laser Damage.