Ultrathin conformal multilayer SiNO dielectric cap for capacitance reduction in Cu/low k interconnects
暂无分享，去创建一个
D. Edelstein | A. Grill | D. Priyadarshini | D. Canaperi | T. Spooner | V. Paruchuri | E. Liniger | C. Parks | T. Shaw | J. Burnham | H. Shobha | S. Cohen | C. K. Hu | D. Collins | S. Nguyen | E. Adams