Automated polarimeter–macroscope for optical mapping of birefringence, azimuths, and transmission in large area wafers. Part I. Theory of the measurement

A computer‐controlled polarimeter–macroscope has been developed to measure birefringence (phase retardation), the principal azimuths and transmission in large area (up to 6 in. diameter) wafers. It consists of two HR‐type linear polarizers which can be rotated simultaneously by a stepper motor versus an immobile wafer. The transmission axes of the polarizers can be set at either 90° or 0° (polariscopic mode) or at 45° (polarimetric mode). The ability of observing samples’ images in the polariscopic mode can be useful for, e.g., quick detection of macroscopic defects. In the polarimetric mode the arrangement is capable of collecting input data through a video frame grabber (VFG)/TV camera detecting system and calculate three maps as stated above within a fraction of a minute. In usual circumstances, using a VFG with 256 grey levels enables determination of birefringence with an error not greater than approximately 5×10−7, whereas errors of azimuths and transmission are of a fraction of a degree and of a pe...

[1]  P. S. Hauge,et al.  Mueller matrix ellipsometry with imperfect compensators , 1978 .

[2]  J Schwider,et al.  Homogeneity testing by phase sampling interferometry. , 1985, Applied optics.

[3]  S. Jacobs,et al.  Automated spatially scanning ellipsometer for retardation measurements of transparent materials. , 1993, Applied optics.

[4]  J. Schwider,et al.  Digital wave-front measuring interferometry: some systematic error sources. , 1983, Applied optics.

[5]  Emil Wolf,et al.  Principles of Optics: Contents , 1999 .

[6]  R. Azzam,et al.  Polarized light in optics and spectroscopy , 1990 .

[7]  P. Carré Installation et utilisation du comparateur photoélectrique et interférentiel du Bureau International des Poids et Mesures , 1966 .

[8]  R. Azzam,et al.  Ellipsometry and polarized light , 1977 .

[9]  W. Shurcliff Polarized light; production and use , 1962 .

[10]  S. Nygren Liquid encapsulated Czochralski growth of 35 mm diameter single crystals of GaP , 1973 .

[11]  J. S. Blakemore,et al.  Distributions of residual stress, dislocations, and EL2 in Czochralski-grown semi-insulating GaAs , 1986 .

[12]  Photorefractive imaging of semiconductor wafers , 1988 .

[13]  James C. Wyant,et al.  Measurement of the inhomogeneity of a window , 1991 .

[14]  Tzu-Wen Huang,et al.  Characterization of growth cells in In-doped GaP crystals by birefringent method , 1990 .

[15]  Pericles S. Theocaris,et al.  Matrix Theory of Photoelasticity , 1979 .

[16]  M. Yamada Quantitative photoelastic measurement of residual strains in undoped semi‐insulating gallium arsenide , 1985 .

[17]  C. S. Vikram,et al.  Algorithm for phase-difference measurement in phase-shifting interferometry. , 1993, Applied optics.

[18]  Masayoshi Yamada,et al.  High-sensitivity computer-controlled infrared polariscope , 1993 .

[19]  S. Lederhandler Infrared Studies of Birefringence in Silicon , 1959 .

[20]  M. Rau,et al.  Distinguishing between EL2 and dislocation formation mechanisms in GaAs by mapping topographies , 1990 .

[21]  Masayuki Watanabe,et al.  Quantitative photoelastic measurement of residual stress in LEC grown GaP crystals , 1980 .

[22]  Russell A. Chipman,et al.  Error analysis of a Mueller matrix polarimeter , 1990 .

[23]  R. Tauber,et al.  Effect of Growth Parameters on the Residual Stress and Dislocation Density of Czochralski‐Grown Silicon Crystals , 1971 .

[24]  Russell A. Chipman,et al.  Linear diattenuation and retardance measurements in an IR spectropolarimeter , 1990, Other Conferences.

[25]  Schwab S. Major,et al.  Polarized Light and Optical Measurement , 1972 .

[26]  A. Witt,et al.  Growth related residual strain in lec GaAs , 1988 .

[27]  H. Weber,et al.  Sensitive and selective polarimeter for application in crystal optics , 1991 .

[28]  Y. Surrel Phase stepping: a new self-calibrating algorithm. , 1993, Applied optics.

[29]  J. S. Blakemore,et al.  Optical mapping of residual stress in Czochralski grown GaAs , 1986 .

[30]  D B Chenault,et al.  Measurements of linear diattenuation and linear retardance spectra with a rotating sample spectropolarimeter. , 1993, Applied optics.