Effect of palladium addition on nickel silicide formation on Si (111)
暂无分享,去创建一个
Jinfang Kong | Wenzhong Shen | Aliaksandra Karabko | Anatoly P. Dostanko | Sergei M. Zavadsky | W. Shen | J. Kong | A. Karabko | A. Dostanko | S. M. Zavadsky
[1] A. P. Dostanko,et al. Phase transition and phonon dynamics in NiPdSi: An annealing study by temperature-dependent Raman spectroscopy , 2009 .
[2] A. Miedema,et al. Cohesion in alloys — fundamentals of a semi-empirical model , 1980 .
[3] P. Gopalan,et al. Silicidation in Ni/Si thin film system investigated by X-ray diffraction and Auger electron spectroscopy , 2007 .
[4] Y. He,et al. Explanation of the enhancement of NiSi thermal stability according to TFD equations and Miedema's model , 2004 .
[5] D. Chi,et al. Raman scattering probe of anharmonic effects in NiSi , 2004 .
[6] Hiroshi Iwai,et al. NiSi salicide technology for scaled CMOS , 2002 .
[7] F. d'Heurle,et al. Effects of additive elements on the phase formation and morphological stability of nickel monosilicide films , 2006 .
[8] Hiroshi Ogawa,et al. Temperature dependence of Raman scattering in hexagonal indium nitride films , 2000 .
[9] J. Chelikowsky. Microscopic basis of Miedema's theory of alloy formation , 1982 .
[10] Christophe Detavernier,et al. Towards implementation of a nickel silicide process for CMOS technologies , 2003 .
[11] Li,et al. Disorder-induced Raman scattering in NiSi2. , 1990, Physical Review B (Condensed Matter).