Over 1.7 kV normally-off GaN hybrid MOS-HFETs with a lower on-resistance on a Si substrate

In this study, normally-off GaN hybrid MOS-HFET devices on 4-inch Si substrates were fabricated, and the device characteristics were examined. As a result, the breakdown voltage (Vb) was improved using a combination of a high-resistive carbon-doped back barrier layer and a thin channel layer of 50 nm. The specific on-resistance (RonA) was estimated to be less than 7.1 mΩcm2 for Lgd = 12 μm, and Vb was estimated to be over 1.71 kV for Lgd = 18 μm. To our knowledge, these values are the best results ever reported for normally-off GaN-based MOSFETs.

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