Hardening of smooth pulsed laser deposited PMMA films by heating

Smooth poly(methyl methacrylate) (PMMA) films without any droplets were pulsed laser deposited at a wavelength of 248 nm and a laser fluence of 125 mJ/cm2. After deposition at room temperature, the films possess low universal hardness of only 3 N/mm2. Thermal treatments up to 200°C, either during deposition or afterwards, lead to film hardening up to values of 200 N/mm2. Using a combination of complementary methods, two main mechanisms could be made responsible for this temperature induced hardening effect well above the glass transition temperature of 102°C. The first process is induced by the evaporation of chain fragments and low molecular mass material, which are present in the film due to the ablation process, leading to an increase of the average molecular mass and thus to hardening. The second mechanism can be seen in partial cross-linking of the polymer film as soon as chain scission occurs at higher temperatures and the mobility and reactivity of the polymer material is high enough.

[1]  S. Hansen,et al.  Formation of polymer films by pulsed laser evaporation , 1988 .

[2]  Hans-Ulrich Krebs,et al.  Pulsed laser deposition of smooth poly(methyl methacrylate) films at 248 nm , 2007 .

[3]  Nicholas S. Nogar,et al.  Mass spectroscopic identification of wavelength dependent UV laser photoablation fragments from polymethylmethacrylate , 1986 .

[4]  A. Itaya,et al.  Pulsed Laser Deposition of Poly(tetrafluoroethylene), Poly(methylmethacrylate), and Polycarbonate Utilizing Anthracene-Photosensitized Ablation , 2002 .

[5]  R. Srinivasan,et al.  Dynamics of UV laser ablation of organic polymer surfaces , 1986 .

[6]  R. A. McGill,et al.  Laser deposition of polymer and biomaterial films. , 2003, Chemical reviews.

[7]  Frank Barkusky,et al.  Near-edge x-ray absorption fine structure measurements using a laboratory-scale XUV source , 2008 .

[8]  P. Cotts,et al.  Incubation: Subthreshold ablation of poly-(methyl methacrylate) and the nature of the decomposition pathways , 2000 .

[9]  Harald Ade,et al.  CALIBRATED NEXAFS SPECTRA OF SOME COMMON POLYMERS , 2003 .

[10]  Andrew G. Glen,et al.  APPL , 2001 .

[11]  G. Blanchet Deposition of Poly(methyl methacrylate) Films by UV Laser Ablation , 1995 .

[12]  J. Moacanin,et al.  Characterization of a dissociative excited state in the solid state: Photochemistry of poly/methyl methacrylate/ - Photochemical processes in polymeric systems. V , 1980 .

[13]  K. O'driscoll,et al.  Chain-length dependence of the glass transition temperature , 1991 .

[14]  R. Larciprete,et al.  Direct observation of excimer-laser photoablation products from polymers by picosecond-uv-laser mass spectroscopy , 1987 .

[15]  Steven G. Hansen,et al.  Arrival time measurements of films formed by pulsed laser evaporation of polycarbonate and selenium , 1988 .

[16]  M. Stuke,et al.  UV-excimer-laser ablation of polymethylmethacrylate at 248 nm: Characterization of incubation sites with Fourier transform IR- and UV-Spectroscopy , 1989 .

[17]  H. Krebs,et al.  Pulsed laser deposition of thin metallic alloys , 1993 .

[18]  H. Krebs,et al.  Tuning of cross-linking and mechanical properties of laser-deposited poly (methyl methacrylate) films , 2005 .

[19]  R. Srinivasan,et al.  Ultraviolet laser ablation and decomposition of organic materials , 1990 .