Improved interfacial and electrical properties of atomic layer deposition HfO2 films on Ge with La2O3 passivation
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Di Wu | Hui Li | Aidong Li | Hui Li | Xuefei Li | Aidong Li | Di Wu | Yan-Qiang Cao | Xiao-Jie Liu | Xuefei Li | Xiao-Jie Liu | Yanqiang Cao
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