Materials selection for thin films for radio frequency microelectromechanical systems

Materials selection is an important subject in microtechnology. The methodology developed by Ashby is used here. It is shown that it can be applied easily to microelectromechanical systems (MEMS). Firstly, a selection concerning a minimization of intrinsic residual stresses for thin films deposited by evaporation process is presented. Secondly, the selection of materials to serve in the design of the bridge of a MEMS-RF switch and a MEMS-RF varicap (variable capacitor) is considered.