论文信息 - Deposition of Copper by Plasma-Enhanced Atomic Layer Deposition Using a Novel N-Heterocyclic Carbene Precursor - 字舞流文

Deposition of Copper by Plasma-Enhanced Atomic Layer Deposition Using a Novel N-Heterocyclic Carbene Precursor

M. Ritala | M. Leskelä | M. Kemell | S. D. Elliott | G. Dey | G. Yap | S. Barry | J. P. Coyle | E. Sirianni | S. Elliott