论文信息 - Critical dimension control in X-ray masks with electroplated gold absorbers - 字舞流文

Critical dimension control in X-ray masks with electroplated gold absorbers

H. Huber | H. Betz | S. Pongratz | W. Windbracke | W. Pilz

[1] F. Ponse,et al. Synchrotron lithography for sub-half-micron T-gates in GaAs-FET , 1986 .

[2] S. Pongratz,et al. Submicron patterns formed by reactive ion etching , 1985 .